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SciCrunch Registry is a curated repository of scientific resources, with a focus on biomedical resources, including tools, databases, and core facilities - visit SciCrunch to register your resource.
https://nanoscience.oxinst.com/proteox
Self supporting Secondary Insert that enhances adaptability, enabling rapid exchange of full experimental setups for multi user, multi experiment system. Upgradeable Secondary Inserts are cross compatible and transferrable between ProteoxTM family systems. Has large experimental volume and abundant line of sight access.
Proper citation: Oxford Proteox Dilution Refrigerator (RRID:SCR_020383) Copy
https://plasma.oxinst.com/products/cvd/plasmapro-100-nano
Chemical Vapour Deposition and PECVD tools for growth of 1D and 2D nanomaterials and heterostructures. PlasmaPro 100 Nano delivers performance growth of nanomaterials with in situ catalyst activation and process control, with flexible temperatures up to 1,200 degrees C.
Proper citation: Oxford PlasmaPro 100 Nano Plasma Technology (RRID:SCR_020384) Copy
https://plasma.oxinst.com/products/rie/80rie
PlasmaPro 80 reactive ion etch is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.
Proper citation: Oxford PlasmaPro 80 RIE Plasma Technology (RRID:SCR_020381) Copy
https://nanoscience.oxinst.com/products/cryofree-magnets/spectromagpt
Split pair, horizontal field magneto optical Cryofree superconducting magnet system. It provides optical access to sample in variable magnetic field and low temperature environment.
Proper citation: Oxford SpectromagPT Superconducting Magnet System (RRID:SCR_020382) Copy
https://plasma.oxinst.com/products/pecvd/plasmapro-80-pecvd
PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.
Proper citation: Oxford PlasmaPro 80 PECVD Plasma Technology (RRID:SCR_020380) Copy
https://plasma.oxinst.com/products/icpcvd/plasmapro-80-icpcvd
PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.
Proper citation: Oxford PlasmaPro 80 ICPCVD Plasma Technology (RRID:SCR_020378) Copy
https://plasma.oxinst.com/products/rie/plasmapro-100
PlasmaPro 100 RIE modules deliver anisotropic dry etching. Being compatible with all wafer sizes up to 200mm, it has rapid change between wafer size, uniformity, high throughput and high precision processes, in situ chamber cleaning and end pointing, and wide temperature range electrode, from 150 degrees C to 400 degrees C.
Proper citation: Oxford PlasmaPro 100 RIE Plasma Technology (RRID:SCR_020376) Copy
https://plasma.oxinst.com/products/icp-etching/80icp
PlasmaPro 80 ICP is compact, small footprint system offering ICP etch solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control.
Proper citation: Oxford PlasmaPro 80 ICP Plasma Technology (RRID:SCR_020377) Copy
https://plasma.oxinst.com/products/ald/flexal
FlexAL systems provide newrange of flexibility and capability in engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition processes and thermal ALD within single ALD systems.
Proper citation: Oxford FlexAL ALD System Plasma Technology (RRID:SCR_020352) Copy
https://plasma.oxinst.com/products/atomic-layer-deposition/atomfab
Uses remote source specifically designed for atomic scale processing. Has low damage for sensitive substrates, fast cycle times and reliablity with uniform plasma exposure and film deposition, short plasma times, 250ms, short strike time, 80ms, for high throughput, and reproducible strike time and low reflected power for high yield.
Proper citation: Oxford Atomfab ALD Plasma Technology (RRID:SCR_020350) Copy
https://nanoscience.oxinst.com/products/control-electronics/mercuryips
Magnet power supply system enables automated control of wide range of superconducting magnets, including NMR, high field, beamline and Vector Rotate magnet systems. MercuryiPS is bi polar and has high stability, four quadrant power supply with incorporated quench protection.
Proper citation: Oxford MercuryiPS Power Supply System (RRID:SCR_020361) Copy
https://plasma.oxinst.com/products/ald/flexal#product-information-tabs
Ion beam deposition products produce deposited films with high quality, dense and smooth surfaces. Ion beam technology provides approach to etch and deposition by offering single tool and maximising system utilisation, which includes open load, single substrate load lock, and cassette to cassette.
Proper citation: Oxford Ionfab 300 IBD Plasma Technology (RRID:SCR_020362) Copy
https://afm.oxinst.com/products/jupiter-family-of-afms/jupiter-xr-afm
Large sample AFM that offers high speed imaging and extended range in single scanner. Jupiter provides complete 200 mm sample access and delivers resolution, results, and versatility for academic research and industrial R and D laboratories.
Proper citation: Oxford Jupiter XR AFM (RRID:SCR_020360) Copy
https://plasma.oxinst.com/products/ion-beam/ionfab
Ion beam etch and deposition system is used for high quality material processing. Systems have flexible hardware options including open load, single substrate load lock, and cassette to cassette.
Proper citation: Oxford Ionfab Ion Beam Plasma Technology (RRID:SCR_020358) Copy
IntegraAC range of recondensing helium systems has been developed to reduce consumption of liquid helium. By recondensing helium gas evaporated within system, this minimises running costs and conserves this limited resource. It is also compatible with wide range of superconducting magnets.
Proper citation: Oxford IntegraAC Helium Magnet System (RRID:SCR_020356) Copy
https://afm.oxinst.com/products/cypher-afm-systems/cypher-vrs-video-rate-afm
Full featured video rate atomic force microscope. This high speed AFM allows researchers to measure nanoscale dynamic processes at video frame rates.
Proper citation: Oxford Cypher VRS AFM (RRID:SCR_020354) Copy
https://nanoscience.oxinst.com/products/magnet-system-configuration/integra-helium-magnet-systems
Helium magnet system. Wide range of superconducting magnet systems up to 22 T, cooled by liquid helium. Ideal for highly vibration sensitive experiments.
Proper citation: Oxford Integra Superconducting Magnet System (RRID:SCR_020355) Copy
https://www.rigaku.com/products/xrf/microz_uls
Wavelenght Dispersive X-ray Fluorescence Sulfur analyzer. Measures ultra low sulfur ULS in petroleum fuels by ASTM D2622 10 and background intensity.
Proper citation: Rigaku Micro-Z ULS analyzer (RRID:SCR_020444) Copy
https://www.thermofisher.com/order/catalog/product/IQLAAEGAAPFALGMBFZ
Identifies and quantifies proteins, peptides, lipids, glycans and small molecules. Combines segmented quadrupole for high performance precursor ion selection with high resolution, accurate mass, ultra high field Orbitrap mass analyzer to deliver combination of scan speed, resolving power, mass accuracy, spectral quality and sensitivity.
Proper citation: Q Exactive HF Hybrid Quadrupole-Orbitrap Mass Spectrometer Q Exactive (RRID:SCR_020425) Copy
Rainin Classic manual single-channel pipette, 100-1000 uL, uses universal-fit tips. Finger hook, light springs, silicone shock absorber, accurate, precise, economical (PR-1000)
Proper citation: Rainin Classic Pipette PR-1000 (RRID:SCR_020422) Copy
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