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| Resource Name | Proper Citation | Abbreviations | Resource Type |
Description |
Keywords | Resource Relationships | |||||||||||||
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
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Oxford MFP-3D Origin+ AFM Resource Report Resource Website |
Oxford MFP-3D Origin+ AFM (RRID:SCR_020367) | instrument resource | Features same core performance as MFP 3D Origin but includes support for complete range of innovative MFP 3D accessories. | Oxford, Atomic Force Microscopy, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Origin_plus | SCR_020367 | 2026-02-14 02:04:03 | 0 | ||||||||||
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Oxford Proteox Dilution Refrigerator Resource Report Resource Website |
Oxford Proteox Dilution Refrigerator (RRID:SCR_020383) | instrument resource | Self supporting Secondary Insert that enhances adaptability, enabling rapid exchange of full experimental setups for multi user, multi experiment system. Upgradeable Secondary Inserts are cross compatible and transferrable between ProteoxTM family systems. Has large experimental volume and abundant line of sight access. | Oxford, Nanoscience, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Proteox | SCR_020383 | 2026-02-14 02:04:03 | 0 | ||||||||||
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Oxford PlasmaPro 100 Nano Plasma Technology Resource Report Resource Website |
Oxford PlasmaPro 100 Nano Plasma Technology (RRID:SCR_020384) | instrument resource | Chemical Vapour Deposition and PECVD tools for growth of 1D and 2D nanomaterials and heterostructures. PlasmaPro 100 Nano delivers performance growth of nanomaterials with in situ catalyst activation and process control, with flexible temperatures up to 1,200 degrees C. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_100_Nano | SCR_020384 | 2026-02-14 02:04:24 | 0 | ||||||||||
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Oxford PlasmaPro 80 RIE Plasma Technology Resource Report Resource Website |
Oxford PlasmaPro 80 RIE Plasma Technology (RRID:SCR_020381) | instrument resource | PlasmaPro 80 reactive ion etch is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_80_RIE | SCR_020381 | 2026-02-14 02:03:54 | 0 | ||||||||||
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Oxford SpectromagPT Superconducting Magnet System Resource Report Resource Website |
Oxford SpectromagPT Superconducting Magnet System (RRID:SCR_020382) | instrument resource | Split pair, horizontal field magneto optical Cryofree superconducting magnet system. It provides optical access to sample in variable magnetic field and low temperature environment. | Oxford, Nanoscience, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_SpectromagPT | SCR_020382 | 2026-02-14 02:04:22 | 0 | ||||||||||
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Oxford PlasmaPro 80 PECVD Plasma Technology Resource Report Resource Website |
Oxford PlasmaPro 80 PECVD Plasma Technology (RRID:SCR_020380) | instrument resource | PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_80_PECVD | SCR_020380 | 2026-02-14 02:04:24 | 0 | ||||||||||
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Oxford PlasmaPro 80 ICPCVD Plasma Technology Resource Report Resource Website |
Oxford PlasmaPro 80 ICPCVD Plasma Technology (RRID:SCR_020378) | instrument resource | PlasmaPro 80 is compact, small footprint system offering etch and deposition solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_80_ICPCVD | SCR_020378 | 2026-02-14 02:04:21 | 0 | ||||||||||
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Oxford PlasmaPro 100 RIE Plasma Technology Resource Report Resource Website |
Oxford PlasmaPro 100 RIE Plasma Technology (RRID:SCR_020376) | instrument resource | PlasmaPro 100 RIE modules deliver anisotropic dry etching. Being compatible with all wafer sizes up to 200mm, it has rapid change between wafer size, uniformity, high throughput and high precision processes, in situ chamber cleaning and end pointing, and wide temperature range electrode, from 150 degrees C to 400 degrees C. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_100_RIE | SCR_020376 | 2026-02-14 02:04:24 | 0 | ||||||||||
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Oxford PlasmaPro 80 ICP Plasma Technology Resource Report Resource Website |
Oxford PlasmaPro 80 ICP Plasma Technology (RRID:SCR_020377) | instrument resource | PlasmaPro 80 ICP is compact, small footprint system offering ICP etch solutions with open loading. Open load design allows fast wafer loading and unloading, ideal for research, prototyping and low volume production. It enables high performance processes using optimised electrode cooling and substrate temperature control. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_80_ICP | SCR_020377 | 2026-02-14 02:03:54 | 0 | ||||||||||
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Oxford FlexAL ALD System Plasma Technology Resource Report Resource Website |
Oxford FlexAL ALD System Plasma Technology (RRID:SCR_020352) | instrument resource | FlexAL systems provide newrange of flexibility and capability in engineering of nanoscale structures and devices by offering remote plasma atomic layer deposition processes and thermal ALD within single ALD systems. | Oxford, Plasma Tehnology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_FlexAL | SCR_020352 | 2026-02-14 02:04:23 | 0 | ||||||||||
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Oxford Atomfab ALD Plasma Technology Resource Report Resource Website |
Oxford Atomfab ALD Plasma Technology (RRID:SCR_020350) | instrument resource | Uses remote source specifically designed for atomic scale processing. Has low damage for sensitive substrates, fast cycle times and reliablity with uniform plasma exposure and film deposition, short plasma times, 250ms, short strike time, 80ms, for high throughput, and reproducible strike time and low reflected power for high yield. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Atomfab | SCR_020350 | 2026-02-14 02:04:21 | 0 | ||||||||||
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Oxford MercuryiPS Power Supply System Resource Report Resource Website |
Oxford MercuryiPS Power Supply System (RRID:SCR_020361) | instrument resource | Magnet power supply system enables automated control of wide range of superconducting magnets, including NMR, high field, beamline and Vector Rotate magnet systems. MercuryiPS is bi polar and has high stability, four quadrant power supply with incorporated quench protection. | Oxford, Nanoscience, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_MercuryiPS | SCR_020361 | 2026-02-14 02:03:54 | 0 | ||||||||||
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Oxford Ionfab 300 IBD Plasma Technology Resource Report Resource Website |
Oxford Ionfab 300 IBD Plasma Technology (RRID:SCR_020362) | instrument resource | Ion beam deposition products produce deposited films with high quality, dense and smooth surfaces. Ion beam technology provides approach to etch and deposition by offering single tool and maximising system utilisation, which includes open load, single substrate load lock, and cassette to cassette. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Ionfab_300_IBD | SCR_020362 | 2026-02-14 02:04:21 | 0 | ||||||||||
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Oxford Jupiter XR AFM Resource Report Resource Website |
Oxford Jupiter XR AFM (RRID:SCR_020360) | instrument resource | Large sample AFM that offers high speed imaging and extended range in single scanner. Jupiter provides complete 200 mm sample access and delivers resolution, results, and versatility for academic research and industrial R and D laboratories. | Oxford, Atomic Force Microscopy, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Jupiter_XR | SCR_020360 | 2026-02-14 02:04:23 | 0 | ||||||||||
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Oxford Ionfab Ion Beam Plasma Technology Resource Report Resource Website |
Oxford Ionfab Ion Beam Plasma Technology (RRID:SCR_020358) | instrument resource | Ion beam etch and deposition system is used for high quality material processing. Systems have flexible hardware options including open load, single substrate load lock, and cassette to cassette. | Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Ionfab | SCR_020358 | 2026-02-14 02:04:21 | 0 | ||||||||||
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Oxford IntegraAC Helium Magnet System Resource Report Resource Website |
Oxford IntegraAC Helium Magnet System (RRID:SCR_020356) | instrument resource | IntegraAC range of recondensing helium systems has been developed to reduce consumption of liquid helium. By recondensing helium gas evaporated within system, this minimises running costs and conserves this limited resource. It is also compatible with wide range of superconducting magnets. | Oxford, Nanoscience, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_IntegraAC | SCR_020356 | 2026-02-14 02:04:23 | 0 | ||||||||||
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Oxford Cypher VRS AFM Resource Report Resource Website |
Oxford Cypher VRS AFM (RRID:SCR_020354) | instrument resource | Full featured video rate atomic force microscope. This high speed AFM allows researchers to measure nanoscale dynamic processes at video frame rates. | Oxford, Atomic Force Microscopy, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_VRS | SCR_020354 | 2026-02-14 02:04:21 | 0 | ||||||||||
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Oxford Integra Superconducting Magnet System Resource Report Resource Website |
Oxford Integra Superconducting Magnet System (RRID:SCR_020355) | instrument resource | Helium magnet system. Wide range of superconducting magnet systems up to 22 T, cooled by liquid helium. Ideal for highly vibration sensitive experiments. | Oxford, Nanoscience, Instrument, Resource equipment, Equipment, USEDit, | Commercially available | Model_Number_Integra | SCR_020355 | 2026-02-14 02:04:03 | 0 | ||||||||||
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Rigaku Micro-Z ULS analyzer Resource Report Resource Website |
Rigaku Micro-Z ULS analyzer (RRID:SCR_020444) | instrument resource | Wavelenght Dispersive X-ray Fluorescence Sulfur analyzer. Measures ultra low sulfur ULS in petroleum fuels by ASTM D2622 10 and background intensity. | Rigaku, WDXRF, Wavelength Dispersive X-Ray Fluorescence, Instrument, Equipment, USEDit, | Commercially available | Model_Number_Micro-Z | SCR_020444 | 2026-02-14 02:04:04 | 0 | ||||||||||
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Q Exactive HF Hybrid Quadrupole-Orbitrap Mass Spectrometer Q Exactive Resource Report Resource Website 1+ mentions |
Q Exactive HF Hybrid Quadrupole-Orbitrap Mass Spectrometer Q Exactive (RRID:SCR_020425) | instrument resource | Identifies and quantifies proteins, peptides, lipids, glycans and small molecules. Combines segmented quadrupole for high performance precursor ion selection with high resolution, accurate mass, ultra high field Orbitrap mass analyzer to deliver combination of scan speed, resolving power, mass accuracy, spectral quality and sensitivity. | Thermo Scientific, Mass Spectrometer, Instrument, Equipment, USEDit, | Commercially available | Model_Number_Q Exactve HF | SCR_020425 | 2026-02-14 02:04:25 | 5 |
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